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Electronics

Nickel(II) hexafluoroacetylacetonate hydrate98%

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339709

SIG339709-5G-EA
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Neodymium(III) acetylacetonate hydrate

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460427

SIG460427-10G-EA
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Tantalum(V) ethoxide99.98% trace metals basis 100G

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339113

SIG339113-100G-EA
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Terbium(III) acetate hydrate99.9% trace metals basis 5G

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325929

SIG325929-5G-EA
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Terbium(III) acetylacetonate hydrate99.9% trace metals basis

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484008

SIG484008-1G-EA
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Tetraethyl orthosilicate99.999% trace metals basis 100ML

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333859

SIG333859-100ML-EA
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Tetraethyl orthosilicatereagent grade, 98% 500ML

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131903

SIG131903-500ML-EA
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Sodium phenoxide trihydrate99% 100G

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318191

SIG318191-100G-EA
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Sodium thiomethoxide95% 5G

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281018

SIG281018-5G-EA
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Rhodium(II) acetate dimer99.99% trace metals basis 250MG

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482285

SIG482285-250MG-EA
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Rhodium(II) acetate dimer99.99% trace metals basis 1G

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482285

SIG482285-1G-EA
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Sepiolitepowder

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70253

SIG70253-1KG-EA
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Samarium(III) acetylacetonate hydrate>=99.9% trace metals basis

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517666

SIG517666-100G-EA
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Siliconwafer (single side polished), <100>, N-type, contains No dopant, diam. x thickness 3 in. x 0.5 mm 1EA

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647535

SIG647535-1EA-EA
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Siliconwafer (single side polished), <100>, N-type, contains phosphorus as dopant, diam. x thickness 3 in. x 0.5 mm

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647802

SIG647802-1EA-EA
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Siliconwafer (single side polished), <100>, P-type, contains boron as dopant, diam. x thickness 3 in. x 0.5 mm

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647764

SIG647764-1EA-EA
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Siliconwafer (single side polished), <111>, N-type, contains No dopant, diam. x thickness 2 in. x 0.5 mm 5EA

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647101

SIG647101-5EA-EA
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Silver acetylacetonate98% 1G

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323489

SIG323489-1G-EA
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Silver acetylacetonate98% 5G

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323489

SIG323489-5G-EA
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Silver trifluoroacetate98% 25G

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T62405

SIGT62405-25G-EA
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Silver trifluoroacetate98% 5G

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T62405

SIGT62405-5G-EA
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Sodium acetate99.995% trace metals basis 10G

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229873

SIG229873-10G-EA
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Platinum(II) acetylacetonate>=99.98% trace metals basis

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523038

SIG523038-1G-EA
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Potassium tert-butoxide solution1.0 M in THF 500ML

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328650

SIG328650-500ML-EA
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Potassium tert-butoxide solution1.0 M in THF 2L

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328650

SIG328650-2L-EA
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Potassium tert-butoxidesublimed grade, 99.99% trace metals basis 25G

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659878

SIG659878-25G-EA
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Potassium acetate99.98% trace metals basis, ~100 ppm Rb, 100G

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255785

SIG255785-100G-EA
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Vanadium(V) oxytripropoxide98%

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470783

SIG470783-25ML-EA
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Vanadyl acetylacetonate98% 10G

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550787

SIG550787-10G-EA
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Zirconium acetate solutionin dilute acetic acid 2L

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413801

SIG413801-2L-EA
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Zirconium(IV) butoxide solution80 wt. % in 1-butanol 100ML

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333948

SIG333948-100ML-EA
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Zirconium(IV) ethoxide97% 5G

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339121

SIG339121-5G-EA
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Zirconium(IV) propoxide solution70 wt. % in 1-propanol 100ML

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333972

SIG333972-100ML-EA
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Ytterbium(III) acetate hydrate99.95% trace metals basis 25G

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544973

SIG544973-25G-EA
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Zinc acetylacetonate hydratepowder 100G

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132306

SIG132306-100G-EA
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EXPANDABLE GRAPHITE FLAKES

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808121

SIG808121-2.5KG-EA
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Fluorosilicic acid solution20-25 wt. % in H2O

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372757

SIG372757-500G-EA
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Fluorosulfonic acidpurified by triple-distillation 100ML

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236535

SIG236535-100ML-EA
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Fluorosulfonic acidpurified by triple-distillation 25ML

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236535

SIG236535-25ML-EA
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3-Oxabicyclo[3.1.0]hexane-2,4-dione98%

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391174

SIG391174-1G-EA
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1-Octadecanethiolpurum, >=95.0% (GC) 250G

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74731

SIG74731-250G-EA
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2,2,2-Trifluoroethyl acrylatecontains 100 ppm MEHQ as inhibitor, 99% 25G

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297720

SIG297720-25G-EA
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2,2,2-Trifluoroethyl acrylatecontains 100 ppm MEHQ as inhibitor, 99% 5G

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297720

SIG297720-5G-EA
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1H,1H,2H,2H-Perfluorooctanephosphonic acid95% 1G

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737461

SIG737461-1G-EA
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1H,1H,2H,2H-Perfluorooctanephosphonic acid95% 5G

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737461

SIG737461-5G-EA
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1-Adamantanethiol99% (GC)

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719234

SIG719234-500MG-EA
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(11-Mercaptoundecyl)-N,N,N-trimethylammonium bromide

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733385

SIG733385-500MG-EA
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(3-Aminopropyl)triethoxysilane>=98.0% 100ML

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741442

SIG741442-100ML-EA
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(3-Aminopropyl)triethoxysilane>=98.0% 500ML

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741442

SIG741442-500ML-EA
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Kit for Creating Hydrophilic PDMS Surface

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701912

SIG701912-1KT-EA
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Iron(0) pentacarbonyl>99.99% trace metals basis 100ML

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481718

SIG481718-100ML-EA
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Manganese(0) carbonyl98% 10G

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245267

SIG245267-10G-EA
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Manganese(0) carbonyl98% 1G

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245267

SIG245267-1G-EA
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o-Carborane98%

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288187

SIG288187-1G-EA
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Octadecylphosphonic acid97%

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715166

SIG715166-1G-EA
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Octylphosphonic acid97% 1G

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735914

SIG735914-1G-EA
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N-Hydroxynaphthalimide triflateelectronic grade, >=99%

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531081

SIG531081-1G-EA
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Phosphoric acidcrystalline, >=99.999% trace metals basis 100G

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466123

SIG466123-100G-EA
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Phosphorus tribromide>=99.99% trace metals basis 50G

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288462

SIG288462-50G-EA
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Phosphorus trichloride99.999% trace metals basis 100G

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310115

SIG310115-100G-EA
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Phosphorus, redpowder, >=99.99% trace metals basis

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343242

SIG343242-5G-EA
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5-Norbornene-2-endo,3-endo-dimethanol98%

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460044

SIG460044-5G-EA
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6-Mercapto-1-hexanol99%

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725226

SIG725226-1G-EA
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NICKEL ELECTROPLATING SOLUTION

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901823-1L

SIG901823-1L-EA
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ELECTROLESS NICKEL PLATING SOLUTION AM&

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901655-1L

SIG901655-1L-EA
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ELECTROLESS NICKEL-BORON PLATING SOLUTI&

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901648-1L

SIG901648-1L-EA
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ELECTROLESS SILVER PLATING SOLUTION

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901669-500ML

SIG901669-500ML-EA
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Poly(2-hydroxyethyl methacrylate)average Mv 1,000,000 10G

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529257

SIG529257-10G-EA
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Poly(2-hydroxyethyl methacrylate)average Mv 300,000, crystalline 10G

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192066

SIG192066-10G-EA
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Poly(2-hydroxyethyl methacrylate)average Mv 300,000, crystalline 25G

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192066

SIG192066-25G-EA
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Poly(butyl methacrylate-co-methyl methacrylate)average Mw ~150,000

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474037

SIG474037-250G-EA
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Poly(dimethylsiloxane), bis(3-aminopropyl) terminatedaverage Mn ~2,500 50ML

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481688

SIG481688-50ML-EA
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